Tuesday, July 14, 2026
Shinoj Nair is on track to achieve his dream of a career in research and development in the semiconductor industry, with the ultimate goal of contributing to technologies that make future electronic devices more reliable and sustainable.
Shinoj Sridharan Nair is a Ph.D. candidate in Interfacial Materials Chemistry working in the lab of Dr. Oliver Chyan at UNT. He was first inspired by materials chemistry while working on his undergrad at the Institute of Science Education and Research (IISER) in India; Shinoj’s current research focuses on chemical processes relevant to semiconductor manufacturing and microelectronic packaging reliability.
 
“I am interested in understanding how the properties of a material can be controlled at the molecular or surface level,” he said. “What drew me further toward semiconductor research was seeing that this type of work can have a direct real-world impact. I find it very rewarding that fundamental chemistry can be translated into technologies that support the devices people use every day.”
 
Shinoj and Dr. ChyanShinoj is on track to achieve his dream of a career in research and development in the semiconductor industry, with the ultimate goal of contributing to technologies that make future electronic devices more reliable and sustainable. He said that his Ph.D. advisor, Dr. Oliver Chyan, has been instrumental in guiding his development as an independent researcher.
 
“Dr. Chyan has helped me approach research questions with both scientific depth and practical relevance,” said Shinoj, who began working on his Ph.D. in 2023. “His mentorship has helped me build confidence in experimental design, materials characterization, technical communication, and project leadership. He has also taught me how to make decisions efficiently and manage multiple research projects at the same time.”
 
A major part of Shinoj’s doctoral research focuses on developing safe and effective methods for cleaning atomically thin films of molybdenum disulfide, or MoS₂, a semiconductor material with potential applications in future electronic devices. His work aims to remove unwanted material left during manufacturing without damaging the delicate MoS₂ film, and a patent application related to this cleaning process is currently in progress. 
 
“This research could help support the development of more reliable, ultra-thin semiconductor transistors for future electronics,” Shinoj explained. “Our work is particularly relevant because it is being conducted with industry partners, including Intel and Tokyo Electron, who are interested in understanding how these materials can be cleaned and integrated without damaging the active semiconductor film.”
 
Shinoj’s research in wire-bonding focuses on molecular passivation coatings that can protect both copper and aluminum surfaces from moisture- and halide-driven corrosion. A provisional patent application related to the process has already been submitted.
 
Shinoj NairIn August, Shinoj will begin a Research Scientist Internship with Tokyo Electron in Austin, working on atomic layer etching, an advanced semiconductor-manufacturing approach that removes material with highly controlled precision.
 
“I am very excited about beginning my internship and continuing to advance my research at UNT,” he said. “I am also looking forward to connecting the different projects I have worked on into a coherent Ph.D. thesis that shows how materials chemistry and surface engineering can address practical semiconductor challenges.”
 
Shinoj has already presented his work at many technical conferences and industry-sponsored meetings, including SRC TECHCON and the IMAPS Device Packaging Conference, where he received the Best Student Presenter Award for his presentation on dual-metal passivation of copper and aluminum for reliable electronic interconnects. He hopes to earn his doctorate in 2027.